WAFER BAKE APPARATUS WITH SHUTTER FOR CORRECTING POSITION OF WAFER

摘要

PURPOSE: A wafer bake apparatus is provided to reduce failures in wafer-loading by correcting the position of a wafer using a shutter. CONSTITUTION: A wafer bake apparatus includes a bake plate, a cover, a shutter, and a driving part. The bake plate(100) is used for heating a wafer(W). The cover(106) is spaced apart from an upper portion of the bake plate as much as a predetermined distance. The shutter(102) is capable of correcting the wafer to be in place by using an inner wall of the same parallel with a side of the bake plate. The driving part(104) is used for moving the shutter up and down.