POSITIVE TYPE PHOTORESIST COMPOSITION FOR MANUFACTURING LCD WHICH FORM FINE RESIST PATTERN WITHOUT DEVIATION IN DIMENSION AND PATTERNING METHOD OF RESIST

摘要

PURPOSE: Provided is a positive type photoresist composition for manufacturing system LCDs, which form fine resist patterns over the whole area of a broad substrate without any deviation in dimension. CONSTITUTION: The positive type photoresist composition permits an integrated section and a display section to be formed at the same time on one substrate, wherein the resist coating layer has a B parameter of 0.1-0.6. The photoresist composition comprises a dye capable of absorbing i-line(365nm). Particularly, The photoresist composition comprises: (A) an alkali-soluble resin, (B) a non-benzophenone quinonediazide group-containing compound, and (C) a phenolic hydroxyl group-containing compound having a molecular weight of 1000 or less.