IN-LINE DEVELOPMENT PROCESSING APPARATUS AND METHOD TO PERFORM HIGH-PRECISION DEVELOPMENT PROCESS WITHOUT DEVELOPMENT SPOTS AND VARIATION OF CD

摘要

PURPOSE: An in-line development processing apparatus is provided to perform a high-precision development process without development spots and variation of CD(critical dimension) by making a temperature distribution on the back surface of a substrate uniform. CONSTITUTION: A developer supply unit(2) for sufficiently supplying developer to the surface of a substrate is installed in a transfer line(1) composed of a plurality of rollers(10). A process unit for the next process is disposed along the transfer line in a lower portion than the developer supply unit. A stand-by unit(3,5,7) is installed between the developer supply unit and the process unit for the next process so that the rollers(10a) of the stand-by unit can rotate in the clockwise direction or the counterclockwise direction.