PROCESS APPARATUS, FABRICATING APPARATUS, PROCESS METHOD AND METHOD FOR FABRICATING ELECTRONIC DEVICE TO FORM ULTRA THIN INSULATION LAYER WITH GOOD ELECTRICAL CHARACTERISTIC

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing apparatus capable of forming an ultra-thin insulating film having superior electric characteristics.;SOLUTION: The manufacturing apparatus is provided with a processing chamber 11 for performing processing for a substrate 1; a susceptor 12 which has a surface made of a quartz and is disposed in the processing chamber 11, and is provided with a heating source 13 for heating the placed substrate 1 at 650°C or below; an introducing system 38 for supplying at least any one of an oxide gas, a nitride gas, a reducing gas, or a gas containing halogen substantially in parallel with the substrate 1; a transparent window 15 disposed on the upper part of the processing chamber 11 oppositely to the susceptor 12; and a light source 36 having plurality of light-emitting wavelengths for irradiating the surface of the substrate 1 with light from the transparent window 15 like a pulse of a pulse width of 0.1 m/s-200 m/s.;COPYRIGHT: (C)2005,JPO&NCIPI