METHOD FOR FORMING CONTACT HOLE, METHOD FOR FABRICATING THIN FILM SEMICONDUCTOR DEVICE, ELECTRONIC DEVICE FABRICATING METHOD AND ELECTRONIC DEVICE TO FORM CONTACT HOLE WITHOUT VACUUM APPARATUS

摘要

PURPOSE: A method for forming a contact hole is provided to form a contact hole by eliminating the necessity of an expensive vacuum apparatus while shortening an interval of time for forming the contact hole. CONSTITUTION: A contact hole is formed to electrically connect the first and second conductive parts through an insulation layer. A mask material(40) is formed on a contact hole region on the first conductive part. An insulation layer is formed on the entire surface of a substrate(10) except the mask material. The mask material is eliminated to form a through hole in the insulation layer.