APPARATUS AND METHOD FOR GENERATING GAS PLASMA, GAS COMPOSITE FOR GENERATING PLASMA, AND METHOD FOR MANUFACTURING SEMICONDUCTOR BY USING THE SAME, ESPECIALLY IMPROVING GENERATION EFFICIENCY OF PLASMA

摘要

PURPOSE: An apparatus and a method for generating the gas plasma, a gas composite for generating the plasma and a method for manufacturing the semiconductor by using the same are provided to reduce the time required for generating the plasma. CONSTITUTION: An apparatus(4) for generating the gas plasma includes a magnetic formation unit(41). The magnetic formation unit is provided with a main magnetic formation unit(41a) and a pair of auxiliary magnetic formation units(41b,41c). The main magnetic formation unit generates the main magnetic field along an axial direction. And the pair of auxiliary magnetic formation units generate the auxiliary magnetic field parallel to the axial direction.