首页> 外国专利> SEMICONDUCTOR CHIP FOR INCREASING PROCESS UNIFORMITY BY ARRANGING PERIPHERAL CIRCUIT REGIONS HAVING LOW DENSITY OF CIRCUIT PATTERNS IN A RADIATIVE DIRECTION ON A CHIP

SEMICONDUCTOR CHIP FOR INCREASING PROCESS UNIFORMITY BY ARRANGING PERIPHERAL CIRCUIT REGIONS HAVING LOW DENSITY OF CIRCUIT PATTERNS IN A RADIATIVE DIRECTION ON A CHIP

机译:通过排列芯片上辐射方向的电路图形密度低的外围电路区域来增加过程均匀性的半导体芯片

摘要

Purpose: semiconductor piece is arranged to increase the quantity of effective chip and improves process uniformity, by reducing one side die region in an edge of a chip. Construction: semiconductor piece (23) includes multiple cell regions (25) and multiple peripheral circuit regions (27). Semiconductor chip has a hexagonal structure, in order to form a honeycomb on chip. In the direction of a radiation of a middle section of semiconductor chip, peripheral circuit region is set. Cell region is made of a shape of parallelogram. Peripheral circuit region is further formed in an edge part of semiconductor chip.
机译:目的:通过减少芯片边缘的一侧管芯区域来布置半导体片,以增加有效芯片​​的数量并提高工艺均匀性。构造:半导体片(23)包括多个单元区域(25)和多个外围电路区域(27)。半导体芯片具有六边形结构,以便在芯片上形成蜂窝。在半导体芯片的中间部分的辐射方向上,设置外围电路区域。单元区域由平行四边形的形状制成。外围电路区域还形成在半导体芯片的边缘部分中。

著录项

  • 公开/公告号KR20050010670A

    专利类型

  • 公开/公告日2005-01-28

    原文格式PDF

  • 申请/专利权人 HYNIX SEMICONDUCTOR INC.;

    申请/专利号KR20030050052

  • 发明设计人 CHO SEOK WON;

    申请日2003-07-22

  • 分类号H01L21/301;

  • 国家 KR

  • 入库时间 2022-08-21 22:05:58

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