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METHOD OF FABRICATING A TFT ARRAY PANEL TO IMPROVE PRODUCTION EFFICIENCY

机译:制造TFT阵列面板以提高生产效率的方法

摘要

PURPOSE: A method of fabricating a TFT(Thin Film Transistor) array panel is provided to improve production efficiency by preventing display badness such as point defects and display stains from being created. CONSTITUTION: The first metal thin film is formed on an insulation substrate and then patterned so as to form gate wiring and a gate electrode of a TFT. A gate insulation film, an active film and an ohmic contact film are formed and then the active film and the ohmic contact film are patterned by dry etching. The second metal thin film is formed and then patterned so as to form a drain electrode(6) and a source electrode(7). Thereafter, the ohmic contact film is removed by etching. After an interlayer dielectric is formed, the interlayer dielectric and the gate insulation film are patterned so as to form a pixel contact hole(9), the first contact hole and the second contact hole. A transparent conductive film is formed and then patterned so as to form a pixel electrode(11).
机译:目的:提供一种制造TFT(薄膜晶体管)阵列面板的方法,以通过防止产生诸如点缺陷和显示污点的显示不良来提高生产效率。组成:第一金属薄膜形成在绝缘基板上,然后进行图案化,以形成栅极布线和TFT的栅电极。形成栅绝缘膜,有源膜和欧姆接触膜,然后通过干法蚀刻将有源膜和欧姆接触膜图案化。形成第二金属薄膜,然后对其进行构图,以形成漏电极(6)和源电极(7)。此后,通过蚀刻去除欧姆接触膜。在形成层间电介质之后,对层间电介质和栅极绝缘膜进行构图,以形成像素接触孔(9),第一接触孔和第二接触孔。形成透明导电膜,然后对其进行构图以形成像素电极(11)。

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