CVD EQUIPMENT CAPABLE OF EASILY LEVELING HEATER BLOCK TO GUARANTEE UNIFORMITY OF SEMICONDUCTOR WAFER AND IMPROVE YIELD OF SEMICONDUCTOR WAFER

摘要

Purpose: CVD (chemical vapor deposition) equipment for the heater block that can easily degradate is arranged to ensure that the uniformity of a semiconductor chip and improves the yield of a semiconductor chip by quantifying the position of a heater block and executing a position adjustment process by quantization value. Construction: a reaction chamber (200) is produced. One shower head (230) injecting jet propelling gas to a chip, is positioned at reaction chamber. It is inner that one chip is placed on the heater block (210) positioned under the shower head of reaction chamber. The upright position of heater block of one heater block lifting mechanism (240) adjustment in the outside of reaction chamber. One interval measure and display (300) measure and are simultaneously shown in the interval between heater block and shower head, including being spaced such that and further including in the outside of reaction chamber by the operation change of heater block lifting mechanism.