METHOD OF MANUFACTURING TRANSPARENT STAMP USED IN NANO-IMPRINTING LITHOGRAPHY TO ACQUIRE EASILY NANO-PATTERNS WITH HIGH ASPECT RATIO WITHOUT DEGRADATION OF NANO-PATTERN SHAPE

摘要

PURPOSE: A method is provided to acquire easily nano-patterns with a high aspect ratio and to obtain an exact shape from each nano-pattern by using a transparent stamp in a nano-imprinting lithography. CONSTITUTION: A mask layer is formed on a silicon substrate(40). Nano patterns are formed on the silicon substrate by performing etching using the mask layer as an etching mask. The mask layer is removed therefrom. A silicon oxide layer(35) is formed thereon. A transparent handling wafer(37) is bonded on the resultant structure. A transparent stamp(30) is completed by removing the substrate therefrom.