In the present invention the substrate alignment device of the exposure device by the exposure device to transfer a pattern formed on a mask onto a substrate, provided with an alignment hole or the like formed to be continuous in the interval on both ends, and the photosensitive material coated on the surface of a substrate; It is disposed above the movement of the substrate path and a UV lamp for projecting UV light to the photosensitive material; The UV lamp disposed in the lower side and the pattern and the position recognition mark is formed and a photomask; And a projection lens for guiding is arranged between the photo mask and the substrate with UV light into the substrate; Disposed in the lower movement path of the substrate and the alignment holes and the imaging illumination system for irradiating the detection light to maethi on the photomask; It is disposed on the image side of the photomask and the image display unit to observe the position recognition mark and Rimed image on the photo-mask; Which is arranged on the upper side of the illumination system by a detection light emitted from the illumination system is configured to include a refractive lens for refracting the detection light to rapid temperature change in the mask, adjust the index of refraction of visible light to be irradiated from the backlight aligned holes Since the by-pass temperature may cause problems to the image on the photomask maethi the correct viewing position for accurate position determination with this, there is a rapid and advantages that can align the position accurately.
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