首页> 外国专利> DRAIN OVERFLOW PREVENTION APPARATUS OF CHEMICAL MECHANICAL POLISHER AND PREVENTION METHOD THEREIN

DRAIN OVERFLOW PREVENTION APPARATUS OF CHEMICAL MECHANICAL POLISHER AND PREVENTION METHOD THEREIN

机译:化学机械树脂的溢流防止装置及其防止方法

摘要

The present invention is N 2 in that, more particularly difficult to determine by visual observation of the leak points arising from polisher part of the N 2 drain overflow (Drain Overflow) protection device and a protection method using a pressure switch to the CMP polisher detects by using a pressure switch to put leak occurs, it is before the order to check the state of the drain portion of the protection that can be achieved the operation reliable equipment through which the removal of the cause of the leakage drain overflow device and a protection method will be.; The present invention, the bottom frame of the robot according to the chemical-mechanical polisher that is installed to drain to the bottom frame and Teflon panel is not fully in contact with each other, there is a discharge tube with nitrogen pressure being supplied to the Teflon panel is provided for this purpose It blocked the bottom drain hole and that detects not to overflow drain to the contact gap in its features.
机译:本发明是N 2 ,因为通过目视观察由N 2 漏溢(漏溢)保护的抛光部分引起的泄漏点更难以确定。使用压力开关对CMP抛光机进行保护的装置和保护方法,通过使用压力开关检测是否发生泄漏,是在检查保护装置的排水部分的状态之前才能实现操作可靠的设备,消除漏水溢流装置的原因和保护方法。在本发明中,根据化学机械抛光机的机器人的底架安装成排泄到底架,并且特氟隆面板不完全彼此接触,存在向其供给氮气压力的排放管。为此提供了特氟龙面板,该面板堵塞了底部排水孔,并在其功能上检测到排水孔不会溢出到接触间隙。

著录项

  • 公开/公告号KR20050069679A

    专利类型

  • 公开/公告日2005-07-05

    原文格式PDF

  • 申请/专利权人 DONGBUANAM SEMICONDUCTOR INC.;

    申请/专利号KR20030101989

  • 发明设计人 PARK SUNG HOO;

    申请日2003-12-31

  • 分类号H01L21/304;

  • 国家 KR

  • 入库时间 2022-08-21 22:04:59

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