首页> 外国专利> SEMICONDUCTOR DEVICE INCLUDING QUANTUM WELL STRUCTURE PROVIDED WITH DUAL BARRIER LAYERS, SEMICONDUCTOR LASER EMPLOYING FOR THE SAME AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE INCLUDING QUANTUM WELL STRUCTURE PROVIDED WITH DUAL BARRIER LAYERS, SEMICONDUCTOR LASER EMPLOYING FOR THE SAME AND METHOD FOR MANUFACTURING THE SAME

机译:包括具有双阻挡层的量子阱结构的半导体装置,用于该装置的半导体激光器的制造方法以及用于制造该装置的方法

摘要

A semiconductor device (100) having a GaInNAs quantum well structure (110) including a plurality of barrier layers (116A,112,116B,118A and 118B) in which the emission wavelength of the device can be controlled by varying the thicknesses and compositions of the barrier layers, a semiconductor laser using the semiconductor device (100) and methods of manufacturing the same are provided. The semiconductor laser includes a GaAs-based substrate (104), a quantum well structure (110) formed on the GaAs-based substrate (104), a cladding layer (106) surrounding the quantum well structure, and a pair of electrodes (102 and 126) electrically connected to the cladding layer (106). The quantum well structure (110) includes a quantum well layer (114), a pair of first barrier layers (116) facing each other with the active region (114) therebetween, and a pair of second barrier layers (118) adjacent to the respective first barrier layers. Optical quality degradation in a long wavelength range, which arises with common quantum well structures, and emission wavelength shifting to a shorter wavelength range, which occurs when a GaInNAs quantum well structure is thermally treated, can be prevented.
机译:具有GaInNAs量子阱结构(110)的半导体器件(100),该半导体器件包括多个势垒层(116A,112、116B,118A和118B),可以通过改变该势垒的厚度和组成来控制该器件的发射波长提供了阻挡层,使用半导体器件(100)的半导体激光器及其制造方法。半导体激光器包括:基于GaAs的衬底(104);形成在基于GaAs的衬底(104)上的量子阱结构(110);围绕量子阱结构的包覆层(106);以及一对电极(102)和126)电连接到包层106。量子阱结构(110)包括:量子阱层(114);彼此相对的一对第一势垒层(116),有源区(114)位于它们之间;以及与第二势垒层相邻的一对第二势垒层(118)。各个第一阻挡层。可以防止由于普通的量子阱结构而导致的长波长范围内的光学质量下降,以及可以防止在对GaInNAs量子阱结构进行热处理时发生的发光波长向较短的波长范围的偏移。

著录项

  • 公开/公告号KR20050073740A

    专利类型

  • 公开/公告日2005-07-18

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20040001805

  • 发明设计人 KIM KI SUNG;

    申请日2004-01-10

  • 分类号H01S5/34;

  • 国家 KR

  • 入库时间 2022-08-21 22:04:54

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