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IMPROVED EPD SYSTEM

机译:改进的EPD系统

摘要

An EPD system with a long service life that enables accurate etch endpoint detection is disclosed. The EPD system according to the present invention is a view port having a groove for receiving the optical cable and the light emitted in the chamber in which the etching process proceeds, the light inserted into the groove of the view port and connected to the view port Cable, and an analyzer for analyzing the wavelength of light transmitted from the optical cable to detect an etch endpoint. Here, the optical cable is composed of a plurality of parallel optical fibers and a coating that fixes and surrounds the optical fiber, the portion of the optical cable connected to the view port is characterized in that the concave (concave) type.
机译:公开了一种使用寿命长的EPD系统,其能够进行精确的蚀刻终点检测。根据本发明的EPD系统是观察口,该观察口具有用于容纳光缆和在蚀刻室中进行的腔室中发射的光的凹槽,该光插入到观察口的凹槽中并连接到观察口。电缆,以及用于分析从光缆传输的光的波长以检测蚀刻终点的分析仪。在此,光缆由多根平行的光纤和固定并包围该光纤的涂层组成,该光缆连接至观察口的部分的特征在于为凹(凹)型。

著录项

  • 公开/公告号KR20050088532A

    专利类型

  • 公开/公告日2005-09-07

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号KR20040013896

  • 发明设计人 KIM SANG WON;

    申请日2004-03-02

  • 分类号H01L21/3065;

  • 国家 KR

  • 入库时间 2022-08-21 22:04:36

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