Improved EPD system and plasma etching apparatus equipped with the same

摘要

PURPOSE: An improved EPD(End Pointer Detector) system and a plasma etch system including the same are provided to enhance the productivity by detecting accurately an end point and lengthening a lifetime of the EPD system. CONSTITUTION: An improved EPD(End Pointer Detector) system includes a view port(300) having a recess for transmitting the light, an optical cable(310) for transmitting the light, and an analyzer(400) analyzing a wavelength of the light and detecting an end point. A plasma etch system includes a process chamber, a supply unit(215), an exhaust unit, a plasma generator, a window, the view port(300), the optical cable(310), and the analyzer(400). The supply unit(215) supplies the reaction gas into the process chamber. The plasma generator is used for activating the reaction gas. The window is connected to one side of the process chamber. The view port(300) is installed at the window.