首页> 外国专利> Layer stack used in semiconductor industry comprises photoresist layer arranged on reflection-reducing layer made from semiconducting or insulating base material on substrate

Layer stack used in semiconductor industry comprises photoresist layer arranged on reflection-reducing layer made from semiconducting or insulating base material on substrate

机译:半导体工业中使用的叠层包括光致抗蚀剂层,该光致抗蚀剂层布置在基板上的由半导体或绝缘基材制成的反射减少层上

摘要

A layer stack comprises a reflection-reducing layer arranged on a substrate, and a photoresist layer arranged on the reflection-reducing layer. The reflection-reducing layer is a semiconducting or insulating base material and has substructures (8) with an average height h, a middle width b and a middle distance s with intermediate chambers (9) arranged between the substructures. The intermediate chambers are filled with the photoresist material and the refraction index of the reflection-reducing layer lies between that of the base material and of the photoresist material. An independent claim is also included for the production of a layer stack.
机译:叠层包括设置在基板上的减反射层和设置在减反射层上的光刻胶层。减反射层是半导体或绝缘基底材料,并且具有平均高度为h,中间宽度为b,中间距离为s的子结构(8),并且在子结构之间设置有中间腔(9)。中间腔室填充有光致抗蚀剂材料,并且反射减小层的折射率介于基础材料和光致抗蚀剂材料的折射率之间。还包括独立权利要求以生产层堆叠。

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