首页>
外国专利>
Layer stack used in semiconductor industry comprises photoresist layer arranged on reflection-reducing layer made from semiconducting or insulating base material on substrate
Layer stack used in semiconductor industry comprises photoresist layer arranged on reflection-reducing layer made from semiconducting or insulating base material on substrate
A layer stack comprises a reflection-reducing layer arranged on a substrate, and a photoresist layer arranged on the reflection-reducing layer. The reflection-reducing layer is a semiconducting or insulating base material and has substructures (8) with an average height h, a middle width b and a middle distance s with intermediate chambers (9) arranged between the substructures. The intermediate chambers are filled with the photoresist material and the refraction index of the reflection-reducing layer lies between that of the base material and of the photoresist material. An independent claim is also included for the production of a layer stack.
展开▼