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Semiconductor component with cell field of strip-shaped trench structures for trench field effect transistors and modified doping regions at lateral ends of trench structures

机译:具有带状沟槽结构的单元场的半导体组件,用于沟槽场效应晶体管,并在沟槽结构的横向端部具有改良的掺杂区

摘要

The semiconductor component has a trough structure arrangement (10) formed in a semiconductor region or chip, for providing a cell field (Z) with a number of strip-shaped trench structures (30) for trench field effect transistors having gate electrode regions (G) within the trench structures and source regions (S), body regions (B) and body contact regions (Bk) between the trench structures. A lateral end region (30e) of each trench structure is enclosed by a modified doping region, for provision of a field plate region. An independent claim for a manufacturing method for a semiconductor component is also included.
机译:半导体部件具有在半导体区域或芯片中形成的槽结构布置(10),用于为单元场(Z)提供具有多个带状沟槽结构(30)的带状沟槽结构(30),用于具有栅电极区域(G)的沟槽场效应晶体管。 )在沟槽结构和沟槽结构之间的源极区(S),体区(B)和体接触区(Bk)内。每个沟槽结构的侧向末端区域(30e)被修改的掺杂区域包围,以提供场板区域。还包括对半导体部件的制造方法的独立权利要求。

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