FILM THICKNESS MEASURING INSTRUMENT, FILM FORMATION DEVICE, FILM THICKNESS MEASURING METHOD, AND FILM FORMATION METHOD

摘要

PROBLEM TO BE SOLVED: To solve a problem wherein a film thickness is not controlled accurately since the film thickness is not accurately measured sometimes when a prediction range of the film thickness is calculated depending on intuition of a worker.;SOLUTION: This film thickness measuring instrument 1 for measuring the thickness of a film M₂ formed in the most surface side on a base material K by layering the same kind of layers R₁, R₂ is provided with am arithmetic processing part 31 for calculating a thickness range of the film M₂, based on a thickness of a bed layer R₁ formed in a base material K side of the uppermost surface side layer R₂ positioned in the uppermost surface side on the base material K, out of the layers R₁, R₂, and a measuring part 30 for measuring the thickness of a film M₂ within the thickness range, using a reflection spectroscopy.;COPYRIGHT: (C)2007,JPO&INPIT