LIGHT INTENSITY DISTRIBUTION SIMULATION SYSTEM, LIGHT INTENSITY DISTRIBUTION SIMULATION METHOD, MASK PATTERN CORRECTING METHOD, AND LIGHT INTENSITY DISTRIBUTION SIMULATION PROGRAM

摘要

PROBLEM TO BE SOLVED: To provide a light intensity distribution simulation system capable of predicting a light intensity distribution of a projection image fast with high precision even when a substrate has a projection portion on its surface.;SOLUTION: The light intensity distribution simulation system includes a central processing unit (CPU) 300 equipped with an area sectioning part 309 for sectioning into a 1st region on the substrate which can be irradiated directly with light having a maximum angle of incidence determined by the numerical aperture of a projection optical system and a 2nd region on the substrate which can not be irradiated directly with the light because of the projection portion on the substrate, a 1st light intensity calculation section 310 which calculates the light intensity in the 1st region by using a direct irradiation component of the light, a 2nd light intensity calculation section 311 which calculates the light intensity of the 2nd region by using reflected light of the light from a flank of the projection portion, and a projection image prediction section 351 which predicts a light intensity distribution of a projection image of a mask pattern projected on the substrate based upon the light intensity in the 1st region and the light intensity in the 2nd region.;COPYRIGHT: (C)2007,JPO&INPIT