PRESSURE GRADIENT ION PLATING TYPE FILM DEPOSITION SYSTEM AND FILM DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a vacuum film deposition system and a vacuum film deposition method using a pressure gradient ion plating process capable of corresponding even to the case that an electrically insulating substance is film-deposited, capable of sufficiently stably depositing a film on a base material as an object, and also capable of obtaining a stably film-deposited base material.;SOLUTION: In the vacuum film deposition system, a pressure gradient hollow cathode type ion plating film deposition part having a pressure gradient plasma gun is provided, and a thin film is deposited on one side of a base material in the film deposition part by an ion plating process, a plasma confining part of forming a discharge plasma-confined space so as to be contacted with the surface of the base material to be film-deposited is provided.;COPYRIGHT: (C)2006,JPO&NCIPI