PRESSURE-GRADIENT ION-PLATING TYPE FILM DEPOSITION SYSTEM AND FILM DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a vacuum film deposition system and a vacuum film deposition method each using a pressure-gradient ion-plating process which are adaptive even to film-deposition of an electrical insulating material, achieve fully stable film-deposition on a target base material, and also stably provide a film-deposited base material.;SOLUTION: The vacuum film deposition system is provided with a pressure-gradient hollow cathode type ion-plating film deposition part having a pressure-gradient type plasma gun, and deposits, by the film deposition part, a thin film on one side of a base material by an ion plating process. The system is provided with: a film deposition activation part where two electrodes each having a magnet forms a pair, and one or more pairs are arranged, voltage is applied between the electrodes being a pair, and discharge plasma is generated so as to be contacted with the surface of a base material to be film-deposited, thus the film deposition material is activated.;COPYRIGHT: (C)2006,JPO&NCIPI