METHOD FOR FORMING PHOTOSENSITIVE POLYIMIDE PATTERN AND ELECTRONIC ELEMENT HAVING THE PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a method capable of forming a photosensitive polyimide pattern which is excellent in pattern precision, prevents a patterning process from being complicated and has weak stress.;SOLUTION: The method for forming the photosensitive polyimide pattern 38 on a metal conductive body 32 comprises the following processes (A) to (E) in the order; a process (A) of forming an ester bond type photosensitive polyimide precursor layer 33 by applying an ester bond type photosensitive polyimide precursor composition on the metal conductive body 32, a process (B) of forming an ionic bond type photosensitive polyimide precursor layer 34 by applying an ionic bond type photosensitive polyimide precursor composition on the precursor layer 33 up to a desired film thickness, a process (C) of transferring a mask pattern as a latent image 36 to the precursor layers 33, 34 by performing exposure via a mask 35, a process (D) of performing development and a process (E) of forming the polyimide pattern 38 by curing the precursor layers 33, 34.;COPYRIGHT: (C)2006,JPO&NCIPI