首页> 外国专利> PATTERNING METHOD, ELECTRO-OPTICAL DEVICE, MANUFACTURING METHOD THEREOF, SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF, PIEZOELECTRIC DRIVING ELEMENT AND MANUFACTURING METHOD THEREOF

PATTERNING METHOD, ELECTRO-OPTICAL DEVICE, MANUFACTURING METHOD THEREOF, SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF, PIEZOELECTRIC DRIVING ELEMENT AND MANUFACTURING METHOD THEREOF

机译:构图方法,光电器件,其制造方法,半导体器件及其制造方法,压电驱动元件及其制造方法

摘要

PROBLEM TO BE SOLVED: To provide a patterning method, a manufacturing method of an electro-optical device and the device, a manufacturing method of a semiconductor device and the device, and a manufacturing method of a piezoelectric driving element and the element, capable of improving productivity without degrading machining accuracy.;SOLUTION: A transparent conductive film 42 made of ITO is formed on the entire upper surface of a second interlayer insulation film 37 having via holes 39, and a metallic film 45 reacting with a hydrochloric acid L for generating hydrogen gas P is formed in an etching region E of the conductive film 42 by applying zinc paste. The transparent conductive film 42 is etched by soaking an element forming surface 14a having the metallic film 45 in the hydrochloric acid L to form an anode 40.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种能够形成图案的方法,电光装置和装置的制造方法,半导体装置和装置的制造方法以及压电驱动元件和元件的制造方法。解决方案:解决方案:在具有通孔39的第二层间绝缘膜37的整个上表面上形成由ITO制成的透明导电膜42,金属膜45与盐酸L反应生成通过涂覆锌膏在导电膜42的蚀刻区域E中形成氢气P。通过将具有金属膜45的元件形成表面14a浸泡在盐酸L中以形成阳极40,来蚀刻透明导电膜42,以形成阳极40。版权所有:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006228894A

    专利类型

  • 公开/公告日2006-08-31

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20050039438

  • 发明设计人 NAKAJIMA TOSHIKI;CHO KEIHEI;

    申请日2005-02-16

  • 分类号H01L21/306;G02F1/13;G02F1/1343;G09F9/30;H02N2/00;H01L21/336;H01L29/786;H01L21/3213;H01L41/22;H01L41/187;

  • 国家 JP

  • 入库时间 2022-08-21 21:54:36

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