首页> 外国专利> JUNCTION FIELD EFFECT TRANSISTOR, JUNCTION HIGH ELECTRON MOBILITY FIELD EFFECT TRANSISTOR, AND MANUFACTURING METHOD THEREOF

JUNCTION FIELD EFFECT TRANSISTOR, JUNCTION HIGH ELECTRON MOBILITY FIELD EFFECT TRANSISTOR, AND MANUFACTURING METHOD THEREOF

机译:结型场效应晶体管,结型高电子迁移率场效应晶体管及其制造方法

摘要

PROBLEM TO BE SOLVED: To simplify manufacturing and stabilize characteristics such as channel length and threshold voltage, relating to a junction field effect transistor.;SOLUTION: A junction type gate region 34 is formed by ion implantation region of C (carbon), and its low diffusion coefficient is utilized to stabilize characteristics such as channel length and threshold voltage. In manufacture, activation of impurities can be simultaneously performed with low resistance regions 33S and 33D of source and drain, for simplified manufacturing.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:为了简化制造并稳定与结型场效应晶体管有关的诸如沟道长度和阈值电压的特性。解决方案:结型栅极区34由C(碳)及其离子注入区形成。低扩散系数用于稳定特性,例如沟道长度和阈值电压。在制造过程中,可以利用源极和漏极的低电阻区域33S和33D同时进行杂质活化,以简化制造。版权所有:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2005347638A

    专利类型

  • 公开/公告日2005-12-15

    原文格式PDF

  • 申请/专利权人 SONY CORP;

    申请/专利号JP20040167481

  • 发明设计人 NOMOTO KAZUO;

    申请日2004-06-04

  • 分类号H01L21/337;H01L29/808;

  • 国家 JP

  • 入库时间 2022-08-21 21:53:03

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