METHOD FOR PRODUCING FILM OF NOBLE METAL, OXIDE FILM OF NOBLE METAL, AND SILICIDE FILM OF NOBLE METAL

摘要

PROBLEM TO BE SOLVED: To provide a method for comparatively easily depositing a film of a noble metal so as not to be contaminated by impurities.;SOLUTION: This manufacturing method comprises the steps of: introducing a volatile halide of the noble metal, in the state of a gaseous phase, and hydrogen of a reducing agent, an oxidizing agent or a silicifying agent, in the state of a gaseous phase, into a reaction chamber (11) accommodating at least one substrate; and reacting both compounds with each other to deposit the film of the noble metal, the oxide film of the noble metal, or the silicide film of the noble metal on the substrate.;COPYRIGHT: (C)2006,JPO&NCIPI