首页> 外国专利> SOFT MAGNETISM FILM, ITS MANUFACTURING METHOD, AND MANUFACTURING METHOD OF THIN FILM MAGNETIC HEAD

SOFT MAGNETISM FILM, ITS MANUFACTURING METHOD, AND MANUFACTURING METHOD OF THIN FILM MAGNETIC HEAD

机译:软磁膜,其制造方法以及薄膜磁头的制造方法

摘要

PROBLEM TO BE SOLVED: To manufacture stably a soft magnetism film with good softness magnetism characteristics and large saturation magnetic flux density.;SOLUTION: The soft magnetism film made of an alloy comprising iron and nickel as main elements is manufactured by electroplating by using the plating current whose direction changes alternately. In this soft magnetism film, when the iron rate is expressed as a% by weight and the nickel rate is expressed as (100-a)% by weight to the sum total of the iron and nickel which are contained in the alloy, the percentage (a) is 80 or more and less than 100. Further, the saturation magnetic flux density of the soft magnetism film is 2.0T or more. When the sum total of the iron and nickel which are contained in the alloy is considered as 100% by weight, the rate of elements other than the iron and nickel contained in the alloy is 1.3% or less by weight.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:为了稳定地制造具有良好的软磁性特性和大的饱和磁通密度的软磁性膜;解决方案:由铁和镍为主要元素的合金制成的软磁性膜通过使用镀覆进行电镀来制造。方向交替变化的电流。在该软磁膜中,相对于合金中所含的铁和镍的合计,将铁率表示为重量%,将镍率表示为(100-a)重量%。 (a)为80以上且小于100。此外,软磁性膜的饱和磁通密度为2.0T以上。当认为合金中所含的铁和镍的总和为100重量%时,合金中所含铁和镍以外的元素的比率为1.3重量%或以下。;版权:(C )2006,日本特许厅

著录项

  • 公开/公告号JP2006147786A

    专利类型

  • 公开/公告日2006-06-08

    原文格式PDF

  • 申请/专利权人 TDK CORP;

    申请/专利号JP20040334886

  • 申请日2004-11-18

  • 分类号H01F41/26;C25D5/18;C25D7/00;G11B5/31;H01F10/14;

  • 国家 JP

  • 入库时间 2022-08-21 21:51:45

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