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The manufacturing method of the soft magnetic film and the soft magnetic film, and thin-film magnetic head, using the soft magnetic film, method of manufacturing the thin film magnetic head

机译:软磁膜和软磁膜的制造方法,以及使用该软磁膜的薄膜磁头,制造该薄膜磁头的方法

摘要

PROBLEM TO BE SOLVED: To solve the problem in the conventional FeNi alloy which is not capable of meeting all requirements such as high saturation magnetic flux density, low stress, and low coercive force and not capable of manufacturing a thin film magnetic head that can cope with the future trend of increase in recording density.;SOLUTION: A lower magnetic pole layer 19 and/or an upper magnetic pole layer 21 are formed of FeNi alloy film by plating. The FeNi alloy film contains 55 to below 75 mass% Fe preferably 68 to 80 mass% Fe, and furthermore 0.116 to below 0.140 mass% S or 0.125 to 0.132 mass% S. By this setup, a thin film magnetic head which is capable of coping properly with an increase in recording density and excellent in corrosion resistance can be manufactured.;COPYRIGHT: (C)2002,JPO
机译:要解决的问题:解决常规的FeNi合金中的问题,该合金不能满足所有要求,例如高饱和磁通密度,低应力和​​低矫顽力,并且不能制造可以应对的薄膜磁头解决方案:下磁极层19和/或上磁极层21由FeNi合金膜通过电镀形成。 FeNi合金膜包含55质量%至75质量%以下的Fe,优选68质量%至80质量%的Fe,并且还包含0.116质量%以下至0.140质量%的S或0.125质量%至0.132质量%的S。通过这种设置,能够制造薄膜磁头。可以适当地应对记录密度的增加,并且具有优异的耐腐蚀性。;版权所有:(C)2002,JPO

著录项

  • 公开/公告号JP3679730B2

    专利类型

  • 公开/公告日2005-08-03

    原文格式PDF

  • 申请/专利权人 アルプス電気株式会社;

    申请/专利号JP20010153355

  • 发明设计人 後藤 光博;

    申请日2001-05-23

  • 分类号H01F10/14;G11B5/31;H01F41/24;

  • 国家 JP

  • 入库时间 2022-08-21 22:27:22

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