Method and the micro lithography projection exposure device which set the optical quality where the projection object glass is intended

摘要

As for this invention, the reticle (24) which is arranged inside object plane surface (22) of the projection object glass (20), through the projection object glass (20), it regards the method of improving the optical image formation quality of the projection object glass (20) which is portion of the micro lithography projection exposure device (10) which image formation it can point on the photosensitive surface (26) which is arranged inside picture plane surface (28). The dipping liquid (38) is introduced in the intermediate space (40) with the end faces (42) of the projection object glass (20) which on the 1st, photosensitive surface (26) and the aforementioned surface (26) confronts. Next, image formation quality of the projection object glass (20) is decided. The image formation quality which is decided is compared with the image formation quality of desire. Until the image formation quality which is decided closely resembles to the image formation quality of desire as much as possible temperature of the dipping liquid (38) is modified. For example it is possible to produce effect on image formation quality of the projection object glass (20) accurately, with the modification of temperature being induced of refractive index of the dipping liquid (38) which can use in order to compensate the spherical aberration of the projection object glass (20).