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METHOD AND SYSTEM FOR MEASURING ISOTOPE PRESENCE RATIO OF GAS

机译:气体同位素比值的测量方法和系统

摘要

PROBLEM TO BE SOLVED: To provide a method for measuring the isotope presence ratio of gas containing impurities near to methane and the isotope of another gas in mass number without modifying methane or acquiring an instrument such as the six-way valve or measuring pipe provided in a general gas chromatograph apparatus, and a system therefor.;SOLUTION: The system is constituted so that an impurities removing pipe formed by filling the conduit, which reaches a mass analyzer from a measuring gas container with an adsorbent is arranged and a conduit for supplying gas not approaching the mass number of a measuring gas is made to face the conduit to the impurities removing pipe and the gas not approaching the mass number of the measuring gas is always supplied under atmospheric pressure. This system is used to allow the measuring gas to flow while allowing the gas not approaching the mass number of the measuring gas to flow to the impurities removing pipe and the pressure of the gas flowing in the mass analyzer is always set to atmospheric pressure to measure the isotope presence ratio.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种无需改变甲烷就可测量含有接近甲烷的杂质的气体的同位素存在率和质量数另一种气体的同位素的方法,而无需购买诸如甲烷的六通阀或测量管之类的仪器解决方案:该系统的结构是:通过填充导管形成的杂质去除管被布置,该杂质去除管从带有吸附剂的测量气体容器中到达质量分析仪,并且导管用于供应使不接近测量气体的质量数的气体面对通向杂质去除管的导管,并且不接近测量气体的质量数的气体总是在大气压下供应。该系统用于允许测量气体流动,同时允许未达到测量气体质量数的气体流入杂质去除管,并且质量分析仪中流动的气体压力始终设置为大气压以进行测量同位素的存在比率。;版权所有:(C)2006,日本特许厅和日本核化学研究所

著录项

  • 公开/公告号JP2006064484A

    专利类型

  • 公开/公告日2006-03-09

    原文格式PDF

  • 申请/专利权人 TOKYO GAS CO LTD;

    申请/专利号JP20040246020

  • 发明设计人 NISHIO SUSUMU;OTA SEIYA;

    申请日2004-08-25

  • 分类号G01N27/62;

  • 国家 JP

  • 入库时间 2022-08-21 21:51:03

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