ELECTRON BEAM LITHOGRAPHY DEVICE, METHOD OF CONTROLLING TEMPERATURE THEREOF, AND CIRCUIT PATTERN MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an electron beam lithography device or a circuit pattern manufacturing device without the need of returning to an auxiliary chamber and again controlling the temperature by re-heating, and with high temperature adjustment accuracy.;SOLUTION: The electron beam lithography device has a sample chamber kept in a vacuum for making lithography by electron beams on a sample held on a sample holding tray and the auxiliary chamber adjacent to the sample chamber, whose air pressure is controlled over a range from a vacuum to an atmospheric pressure, for keeping the sample to be put in/out of the sample chamber while put in the tray. A temperature sensor for measuring the temperature of the sample is provided on the sample holding tray. The temperature measurement of the sample in the sample chamber and in the auxiliary chamber is done by the temperature sensor. The temperature of the sample is controlled based on the temperature measurement of the temperature sensor.;COPYRIGHT: (C)2006,JPO&NCIPI