PURPOSE: To provide a film covered material having a film excellent in hardness and toughness on the surface of a base material. ;CONSTITUTION: This film covered material 2 is constituted so as to form a chromium nitride based film 6 composed of chromium nitride alone or chromium nitride and chromium on the surface of the base material 4 and a carbon based film 8 composed of at least one of carbon and carbon nitride containing a diamond structural carbon on the surface of the chromium nitride based film 6. The film covered material is produced by executing the vapor deposition of chromium and the irradiation of ion beam containing at least nitrogen ion and next, the deposition of carbon and the irradiation of ion beam containing at least one of an inert gas ion and nitrogen ion.;COPYRIGHT: (C)1996,JPO
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