Dissolution inhibitors in photoresist compositions for microlithography

摘要

The invention relates to a photoresist composition comprising a polymeric binder; a photoactive component; and at least one dissolution inhibitor comprising a paraffinic or cycloparaffinic compound containing at least one functional group having the structure —C(R_f)(R_f′)OR wherein R_f and R_f′ are the same or different fluoroalkyl groups of from one or taken together are (CF₂)_a wherein a is an integer ranging from 2 to about 10 and R is a hydrogen atom or an acid labile protecting group. Typically, the dissolution inhibitor has an absorption coefficient of less than about 4.0 μm at a wavelength of 157 nm.