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Dissolution inhibitors in photoresist compositions for microlithography
Dissolution inhibitors in photoresist compositions for microlithography
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机译:用于微光刻的光刻胶组合物中的溶解抑制剂
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摘要
The invention relates to a process for the production of a chip by using immersion lithography, comprising the step of forming a photoresist layer on a substrate, wherein the photoresist layer is prepared from a photoresist composition comprising:(a) a binder;(b) a photoactive component.(c) a fluor containing compound.
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