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Method for characterization of the illuminator in a lithographic system

机译:在光刻系统中表征照明器的方法

摘要

Pupil intensity distribution of an imaging system is measured by exposing an image field of a radiation detector with a bright feature, positioning the detector at a distance away from the image plane, and exposing the image field of the detector with a bright feature, resulting in a cumulative exposure of the image field of the detector from the two exposures. A characteristic of a spatial pattern in the cumulative exposure of the image field of the detector is then determined.
机译:成像系统的瞳孔强度分布是通过以下方法测量的:将具有明亮特征的辐射探测器的像场曝光,将探测器放置在距像平面一定距离的位置,然后将具有明亮特征的探测器的像场曝光,从而得到两次曝光后探测器的像场的累积曝光。然后确定检测器的像场的累积曝光中的空间图案的特征。

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