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Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography
Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography
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机译:用用于极端紫外线光刻的马瑟型等离子体加速器产生极紫外光的方法
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摘要
A device and method for generating extremely short-wave ultraviolet electromagnetic wave uses two intersecting plasma beams generated by two plasma accelerators. The intersection of the two plasma beams emits electromagnetic radiation and in particular radiation in the extreme ultraviolet wavelength. In the preferred orientation two axially aligned counter streaming plasmas collide to produce an intense source of electromagnetic radiation at the 13.5 nm wavelength. The Mather type plasma accelerators can utilize tin, or lithium covered electrodes. Tin, lithium or xenon can be used as the photon emitting gas source.
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