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Process for producing an etching mask on a microstructure, in particular a semiconductor structure with trench capacitors, and corresponding use of the etching mask
Process for producing an etching mask on a microstructure, in particular a semiconductor structure with trench capacitors, and corresponding use of the etching mask
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机译:在微结构上,特别是在具有沟槽电容器的半导体结构上制造蚀刻掩模的方法以及蚀刻掩模的相应用途
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摘要
Process for producing an etching mask on a microstructure, in particular a semiconductor structure with trench capacitors, and corresponding uses of the etching mask which allow for extremely thin photoresist layers to be employed.
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