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Method for revealing crystalline defects and/or stress field defects at the molecular adhesion interface of two solid materials

机译:在两种固体材料的分子粘附界面处揭示晶体缺陷和/或应力场缺陷的方法

摘要

A process for permitting defects or stresses in a structure to be revealed, including (a) securing by molecular bonding of a face of a first element containing crystalline material with a face of a second element containing crystalline material, so that the faces have offset crystalline lattices, the securing causing the formation of a lattice of crystalline defects and/or stress fields in a crystalline zone next to the securing interface, and (b) reducing the thickness of one of the elements until at least a thin film is obtained which adheres to the other element, along the securing interface to form the structure, the thickness of the thin film being such that its free face does not reveal the crystalline defect lattice and/or the stress fields, but allowing to perform (c) treatment of the thin film resulting in that its free face reveals the crystalline defect lattice and/or the stress fields.
机译:一种允许揭示结构中的缺陷或应力的方法,该方法包括(a)通过分子键合将包含晶体材料的第一元素的表面与包含晶体材料的第二元素的表面固定在一起,从而使表面具有偏移的晶体晶格,该晶格导致在晶格区域中紧挨着晶格界面的地方形成晶体缺陷和/或应力场的晶格,并且(b)减小其中一个元素的厚度,直到获得至少一层粘附的薄膜对于另一元件,沿着固定界面形成结构,薄膜的厚度使得其自由面不暴露出晶体缺陷晶格和/或应力场,而是允许进行(c)处理。薄膜导致其自由面暴露出晶体缺陷晶格和/或应力场。

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