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Enhancement of fabrication yields of nanomechanical devices by thin film deposition
Enhancement of fabrication yields of nanomechanical devices by thin film deposition
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机译:通过薄膜沉积提高纳米机械装置的制造良率
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摘要
A protective film is applied onto a nanostructural feature supported on a sacrificial layer by energy beam assisted deposit of material from a vapor through which the beam passes. A wet etchant is applied to etch away the sacrificial layer beneath the nanostructural feature to leave it suspended as a cantilever or bridge. The film protects the structural feature from damage during etching, and may be removed after the wet etching process is completed.
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