首页>
外国专利>
Heat exchanger, substrate, and process for depositing a layer of amorphous carbon on a substrate.
Heat exchanger, substrate, and process for depositing a layer of amorphous carbon on a substrate.
展开▼
机译:热交换器,衬底以及用于在衬底上沉积非晶碳层的方法。
展开▼
页面导航
摘要
著录项
相似文献
摘要
"Heat exchanger, substrate, and process for depositing a layer of amorphous carbon on a substrate.Process for the deposition of a layer of amorphous carbon substrates, such as heat exchangers, and coated substrates formed as a heat exchanger of thin aluminum.The heat exchanger includes a heat sink having deposited on its surface is extended.A layer of a coating of amorphous carbon (DLC) having a hardness of at least 2000kg / mmu00ac 2u00ac, a specific resistivity of at least 10u00ac 8u00ac ohm cm.And a dielectric strength of at least 10u00ac 6u00ac V / cm.
展开▼
机译:热交换器,基底和在基底上沉积无定形碳层的方法。沉积无定形碳基底的层的方法,例如热交换器和形成为薄铝的热交换器的涂覆基底。热交换器包括一个在其表面上沉积有散热器的散热器。一层非晶碳(DLC)涂层,其硬度至少为2000kg / mm 2,比电阻至少为10ac 8欧·欧姆·厘米,介电强度至少10欧·6欧/厘米。
展开▼