PROCESS FOR LOCAL PASSIVATION OF A SUBSTRATE BY A HYDROGEN AMORPHOUS CARBON LAYER AND METHOD FOR MANUFACTURING THIN FILM TRANSISTORS ON THE PASSIVE SUBSTRATE.

摘要

The local passivation process consists in producing patterns (3) of photosensitive resin on the substrate (1), in subjecting the structure obtained to a radiofrequency plasma consisting essentially of hydrocarbon to thereby deposit a layer (6) of hydrogenated amorphous carbon on the structure and dissolving the patterns (3) of the resin in order to eliminate the amorphous carbon deposited on the resin, the amorphous carbon deposited on the substrate constituting said passivation.