A method for the locally passivation of a substrate with an amorphous, hydrogen-containing carbon layer and a method for the production of thin film - transistors on this passivated substrate.

摘要

The process of the local passivation consists in producing the units (3) of photosensitive resin on the substrate (1), to subject the structure obtained with a radiofrequency plasma consisting essentially of hydrocarbons in order to deposit a layer (6) of hydrogenated amorphous carbon on the structure and to dissolve the units (3) of the resin in order to eliminate the amorphous carbon deposited on the resin, the amorphous carbon deposited on the substrate constituting the passivation.