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METHOD OF MAKING MoO2 POWDERS, PRODUCTS MADE FOR MoO2 POWDERS, DEPOSITION OF MoO2 THIN FILMS, AND METHODS OF USING SUCH MATERIALS
METHOD OF MAKING MoO2 POWDERS, PRODUCTS MADE FOR MoO2 POWDERS, DEPOSITION OF MoO2 THIN FILMS, AND METHODS OF USING SUCH MATERIALS
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机译:MoO2粉末的制造方法,MoO2粉末制成的产品,MoO2薄膜的沉积以及使用这种材料的方法
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摘要
The invention relates to high purity MoO2 powder by reduction of ammonium molybdate or molybdenum trioxide using hydrogen as the reducing agent in a rotary or boat furnace. Consolidation of the powder by press/sintering, hot pressing, and/or HIP is used to make discs, slabs, or plates, which are used as sputtering targets. The MoO2 disc, slab, or plate form is sputtered on a substrate using a suitable sputtering method or other physical means to provide a thin film having a desired film thickness. The thin films have properties such as electrical, optical, surface roughness, and uniformity comparable or superior to those of indium-tin oxide (ITO) and zinc-doped ITO in terms of transparency, conductivity, work function, uniformity, and surface roughness. The MoO2 and MoO2 containing thin films can be used in organic light-emitting diodes (OLED), liquid crystal display (LCD), plasma display panel (PDP), field emission display (FED), thin film solar cell, low resistivity ohmic contacts, and other electronic and semiconductor devices.
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