CHEMICAL AMPLIFICATION PHOTORESIST COMPOSITION, PHOTORESIST LAYER LAMINATE, METHOD FOR PRODUCING PHOTORESIST COMPOSITION, METHOD FOR PRODUCING PHOTORESIST PATTERN AND METHOD FOR PRODUCING CONNECTING TERMINAL

摘要

A chemical amplification photoresist composition which comprises (a) a resin exhibiting the solubility in an alkali which is changed by an acid, (b) a compound generating an acid upon irradiation with a radiation and (c) an anticorrosive agent; a photoresist layer laminate comprising a support and said photoresist composition laminated thereon, a method for producing a photoresist pattern using the laminate, and a method for producing a connecting terminal. The above chemical amplification photoresist composition is stable and free from the change of the solubility in an alkali before the irradiation with a radiation.