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PROCESS FOR THE GROWTH IN SIC NANOWIRES DIRECTLY FROM NIO/SI

机译:NIO / SI直接导致SIC纳米线增长的过程

摘要

The present invention was applied to a nickel catalyst dissolved in alcohol Light Night Light Hex Hyde on a silicon substrate Then, the mixture of the catalyst and the silicon substrate is coated with tungsten oxide powder and carbon powder at the same time put on sapphire boat while injecting the inert gas in the heating and cooling to room temperature to a high density of highly pure carbon coated silicon carbide nanowires produced by , work to do this is a first step of applying a catalyst solution in a silicon substrate, and a second step that holds the mixture in an oven with a tungsten oxide powder and carbon powder coated with a silicon substrate, and the third for injecting argon gas in the oven process, and the oven to perform the heating step for a period of time to a predetermined temperature and a fourth step of forming a nanowire aiming on a silicon substrate. Therefore, an additional device or only operation through simple heating without the need for high purity, can be produced a high-density carbon-coated silicon carbide nanowires, thus producing carbon-coated silicon carbide nanowires, the field of display devices as a field emission material There are available on the effect.
机译:将本发明应用于溶解在硅基板上的乙醇轻夜光六面体海德中的镍催化剂,然后,将催化剂和硅基板的混合物同时用氧化钨粉末和碳粉末涂覆在蓝宝石舟上,同时在加热和冷却至室温下,将惰性气体注入高密度的高纯度碳包覆的碳化硅纳米线,以制造高纯度的碳,这是第一步,是将催化剂溶液施加到硅基板上,第二步是将混合物保持在带有氧化钨粉末和碳粉并涂有硅基板的烤箱中,第三种用于在烤箱过程中注入氩气,并在烤箱中执行一段时间的加热步骤,直至达到预定温度,形成针对硅衬底的纳米线的第四步骤。因此,可以生产高密度的碳包覆的碳化硅纳米线,而无需额外的设备或仅通过简单加热就可以进行操作,从而生产出高密度的碳包覆的碳化硅纳米线,从而将碳包覆的碳化硅纳米线作为场发射的显示设备领域。材质有可用的效果。

著录项

  • 公开/公告号KR20060021580A

    专利类型

  • 公开/公告日2006-03-08

    原文格式PDF

  • 申请/专利权人 POSTECH FOUNDATION;

    申请/专利号KR20040070373

  • 申请日2004-09-03

  • 分类号B82B3;

  • 国家 KR

  • 入库时间 2022-08-21 21:26:20

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