Device of Annealing Laser Beam and Method for Sequential Lateral Solidification Silicon Using the same

摘要

PURPOSE: A laser irradiating apparatus and a silicon crystallization method using the laser irradiating apparatus are provided to perform crystallization in X and Y directions without a stage rotation. CONSTITUTION: A laser irradiating apparatus includes a mask(100) comprising the first region(X) in which transmission parts(D) are formed in X direction and the second region(Y) in which transmission parts(E) are formed in Y direction. The laser irradiating apparatus further includes a light-shielding pattern selectively masking the first and second regions of the mask. One of the first and second regions of the mask is selectively masked by the light-shielding pattern according to a substrate movement state and the other region is opened such that a laser beam transmits the opened region.