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Automatic Optical Proximity CorrectionOPC Rule Generation

机译:自动光学邻近校正OPC规则生成

摘要

The present invention relates to a method of automatically applying optical proximity correction techniques to a reticle design for containing a plurality of features. The method includes (1) generating a first set of rules for applying scatter bar assist features to said plurality of features; (2) generating a second set of rules for applying biasing to said plurality of features; (3) forming a look-up table that contains the rules of the rules and the second set of the first set; And (4) the look-up by the rules of the rules and the second set of the first set included in the table analyzing each of said plurality of features, wherein any one of the rules of the rule or the second set of the first set is It comprises the step of determining whether to apply a given feature. Where applicable the rule or feature any one of the given rules of the second set of the first set, the given feature is characterized in that it is modified in accordance with the applicable rules.
机译:本发明涉及一种自动将光学邻近校正技术应用于包含多个特征的掩模版设计的方法。该方法包括:(1)生成用于将散射条辅助特征应用于所述多个特征的第一组规则; (2)产生第二组规则,以对所述多个特征施加偏置; (3)形成包含该规则的规则和第一组的第二组的查找表; (4)通过分析包括在表中的第一组的第二组规则和规则来进行分析,其中,所述规则的任何一个或第一组的第二组设置为包括确定是否应用给定特征的步骤。在适用的规则或特征中,第一组的第二组的任何给定规则中,给定特征的特征在于,其根据适用规则进行了修改。

著录项

  • 公开/公告号KR100583697B1

    专利类型

  • 公开/公告日2006-05-25

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20030051642

  • 发明设计人 시쑤에롱;첸장풍;

    申请日2003-07-25

  • 分类号H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 21:23:45

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