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HIGH BRIGHTNESS GALLIUM NITRIDE-BASED LIGHT EMITTING DIODE WITH TRANSPARENT CONDUCTING OXIDE SPREADING LAYER
HIGH BRIGHTNESS GALLIUM NITRIDE-BASED LIGHT EMITTING DIODE WITH TRANSPARENT CONDUCTING OXIDE SPREADING LAYER
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机译:具有透明导电氧化物扩散层的高亮度氮化镓基发光二极管
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摘要
A new transparent conducting oxide (TCO), which can be expressed as AlSUBx/SUBGaSUB3-x-y/SUBInSUB5+y/SUBSnSUB2-z/SUBOSUB16-2z/SUB; 0=x1, 0y3, 0=z2, has been used to improve the brightness and current spreading in GaN base LED process. The optical properties of this system are superior to regular Ni/Au transparent conducting layer in blue-green region, and the new AlSUB2/SUBOSUB3/SUB-GaSUB2/SUBOSUB3/SUB-InSUB2/SUBOSUB3/SUB-SnOSUB2 /SUBsystem is able to increase the brightness at 1.5~2.5 time to compare to regular process. Furthermore, the new transparent conducting oxide thin film has the highest conductivity, which is better than the Ni/Au transparent conducting thin film.
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机译:一种新的透明导电氧化物(TCO),可以表示为Al x SUB> Ga 3-xy SUB> In 5 + y SUB> Sn 2 -z SUB> O 16-2z SUB>; 0 <= x <1,0 2 SUB> O 3 SUB> -Ga 2 < / SUB> O 3 SUB> -In 2 SUB> O 3 SUB> -SnO 2 SUB>系统能够将亮度提高到1.5 〜2.5时间与常规过程进行比较。此外,新型透明导电氧化物薄膜具有最高的电导率,比Ni / Au透明导电薄膜要好。
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