Photoresist copolymer for preventing acid diffusion, and photoresist composition comprising the same

摘要

The invention photolithography step of the acid diffusion controller to prevent the acid generated in the exposed portion by the exposure process to be diffused to unexposed portion for preventing the photoresist copolymer and photo relates to a resist composition, at least one or more copolymerizable carbon-containing them - a compound having a carbon-carbon double bond, to be formed an ultra-fine pattern by adding a photoresist copolymer comprising a repeating unit represented by formula (1) in the photoresist composition, the line edge roughness (line edge roughness: LER) and slow can improve the profile (Slope), improving the appearance of a pattern by removing the top LOS (loss Top), and the addition can improve the adhesion of the photo resist pattern (adhesion) to the substrate. ; Formula 1 ; Wherein ; n is an integer selected from 1 to 5.