首页> 外国专利> PROCESS FOR DEPOSITING LAYERS BASED ON METAL OXIDES, SUBSTRATE PROVIDED WITH A ETCHED LAYER OBTAINED FROM SAID PROCESS AND METHODS OF MANUFACTURING LAYERS USING SAID DEPOSITION PROCESS IN THE DEPOSITION OF A LAYER AND IN THE INDUSTRY

PROCESS FOR DEPOSITING LAYERS BASED ON METAL OXIDES, SUBSTRATE PROVIDED WITH A ETCHED LAYER OBTAINED FROM SAID PROCESS AND METHODS OF MANUFACTURING LAYERS USING SAID DEPOSITION PROCESS IN THE DEPOSITION OF A LAYER AND IN THE INDUSTRY

机译:基于金属氧化物的沉积过程,提供有从上述过程获得的蚀刻层的基质以及在沉积层和工业中使用所述沉积过程制造层的方法

摘要

Sol-gel process for depositing a metal oxide layer on a substrate comprises irradiating the sol layer on the substrate with ultraviolet (UV) radiation before gel formation by heat treatment. Process for depositing a continuous or discontinuous metal oxide layer on a substrate, especially a transparent substrate, comprises: (1) preparing a sol from at least one metal oxide precursor, at least one chelating agent/stabilizer and optionally at least one solvent and/or dopant precursor, (2) depositing a layer of the sol on at least part of one side of the substrate, (3) irradiating at least part of the sol layer with UV radiation, and (4) heat treating at least the part of the sol layer that has been UV-irradiated.
机译:用于在基板上沉积金属氧化物层的溶胶-凝胶工艺包括在通过热处理形成凝胶之前用紫外线(UV)辐射在基板上的溶胶层。在基材,特别是透明基材上沉积连续或不连续的金属氧化物层的方法包括:(1)由至少一种金属氧化物前体,至少一种螯合剂/稳定剂和任选的至少一种溶剂和/或制备溶胶或掺杂剂前体;(2)在衬底至少一侧的一部分上沉积一层溶胶,(3)用紫外线辐射至少一部分溶胶层,以及(4)对至少一部分溶胶进行热处理经过紫外线照射的溶胶层。

著录项

  • 公开/公告号KR100607595B1

    专利类型

  • 公开/公告日2006-08-02

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR19990008233

  • 申请日1999-03-12

  • 分类号C23C14/04;

  • 国家 KR

  • 入库时间 2022-08-21 21:23:16

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