METHOD FOR DEPOSITING ?-NPB THIN LAYER WITH ALD

摘要

The present invention relates to a method for producing α-NPB thin film using the atomic layer deposition method.;The present invention is a method for producing a thin film using the atomic layer deposition method,;1) placing a substrate inside the reaction chamber and maintaining the substrate at a specific reaction temperature;;2) feeding an arylamine raw material into the reaction chamber and reacting; And;3) supplying the aryl halide raw material and the reaction gas for reacting the aryl halide raw material with the arylamine raw material together and reacting the inside of the reaction chamber; α-NTB thin film manufacturing method comprising a To provide.;Organic EL, α-NPB, hole transport material